Focused Ion Beam (FIB) SEM combines a scanning electron microscope with a focused ion beam for high-precision imaging, milling, and analysis of materials at the micro- and nanoscale. The electron beam provides detailed surface imaging, while the ion beam allows site-specific material removal, cross-sectioning, and sample preparation for transmission electron microscopy. FIB-SEM systems are widely used in materials science, semiconductor research, failure analysis, and nanotechnology for 3D reconstruction, microfabrication, and elemental mapping. Advanced systems often include in-situ deposition, imaging detectors, and high-resolution milling capabilities.