A Focused Ion Beam (FIB) Scanning Electron Microscope combines high-resolution SEM imaging with a focused ion beam for precise material removal, deposition, or milling at the micro- and nanoscale. This dual capability allows detailed imaging, 3D reconstruction, and site-specific sample preparation for advanced analysis.
FIB-SEM systems are widely used in materials science, semiconductor research, nanotechnology, and failure analysis, enabling applications such as cross-sectioning, circuit editing, and microstructural characterization.